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Volume 65 
Part 2 
Page o321  
February 2009  

Received 2 January 2009
Accepted 9 January 2009
Online 17 January 2009

Key indicators
Single-crystal X-ray study
T = 296 K
Mean [sigma](C-C) = 0.006 Å
Disorder in main residue
R = 0.080
wR = 0.291
Data-to-parameter ratio = 15.5
Details
Open access

Benzyltributylammonium 7-hydroxynaphthalene-1-sulfonate

aDepartment of Applied Physics, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, 240-8501 Yokohama, Japan
Correspondence e-mail: mizu-j@ynu.ac.jp

The title compound, C19H34N+·C10H7O4S-, is a charge-control agent used for toners in electrophotography. The anions form one-dimensional chains by O-H...O hydrogen bonds in a zigzag fashion along the c axis between the OH group of one anion and the sulfonate O atom of a neighboring anion. One of the n-butyl chains of the cation is disordered over two sites in a 0.77:0.23 ratio.

Related literature

For the function of charge-control agents, see: Nash et al. (2001[Nash, R. J., Grande, M. L. & Muller, R. N. (2001). Proceedings of the 7th International Conference on Advances in Non-Impact Printing Technology, pp. 358-364.]) and for the structure of benzyltributylammonium 4-hydroxynaphthalene-1-sulfonate, benzyltributylammonium 6-hydroxynaphthalene-2-sulfonate, and benzyltributylammonium 4-hydroxynaphthalene-2-sulfonate see: Mizuguchi et al. (2007[Mizuguchi, J., Sato, Y., Uta, K. & Sato, K. (2007). Acta Cryst. E63, o2509-o2510.]), Uta et al. (2009[Uta, K., Sato, Y. & Mizuguchi, J. (2009). Acta Cryst. E65, o319.]), and Uta & Mizuguchi (2009[Uta, K. & Mizuguchi, J. (2009). Acta Cryst. E65, o320.]), respectively.

[Scheme 1]

Experimental

Crystal data
  • C19H34N+·C10H7O4S-

  • Mr = 499.70

  • Monoclinic, P 21 /c

  • a = 19.8286 (6) Å

  • b = 8.8549 (2) Å

  • c = 16.7501 (4) Å

  • [beta] = 104.7570 (13)°

  • V = 2843.98 (13) Å3

  • Z = 4

  • Cu K[alpha] radiation

  • [mu] = 1.27 mm-1

  • T = 296.1 K

  • 0.39 × 0.36 × 0.04 mm

Data collection
  • Rigaku R-AXIS RAPID diffractometer

  • Absorption correction: multi-scan (ABSCOR; Higashi, 1995[Higashi, T. (1995). ABSCOR. Rigaku Corporation, Tokyo, Japan.]) Tmin = 0.650, Tmax = 0.951

  • 24641 measured reflections

  • 5082 independent reflections

  • 2591 reflections with F2 > 2[sigma](F2)

  • Rint = 0.042

Refinement
  • R[F2 > 2[sigma](F2)] = 0.080

  • wR(F2) = 0.291

  • S = 1.02

  • 5082 reflections

  • 328 parameters

  • H-atom parameters constrained

  • [Delta][rho]max = 0.22 e Å-3

  • [Delta][rho]min = -0.71 e Å-3

Table 1
Hydrogen-bond geometry (Å, °)

D-H...A D-H H...A D...A D-H...A
O4-H4O...O1i 0.82 1.91 2.729 (3) 173
Symmetry code: (i) [x, -y+{\script{1\over 2}}, z+{\script{1\over 2}}].

Data collection: PROCESS-AUTO (Rigaku, 1998[Rigaku (1998). PROCESS-AUTO. Rigaku Corporation, Tokyo, Japan.]); cell refinement: PROCESS-AUTO; data reduction: CrystalStructure (Rigaku/MSC, 2006[Rigaku/MSC (2006). CrystalStructure. Rigaku/MSC, The Woodlands, Texas, USA.]); program(s) used to solve structure: SIR2004 (Burla et al., 2003[Burla, M. C., Camalli, M., Carrozzini, B., Cascarano, G. L., Giacovazzo, C., Polidori, G. & Spagna, R. (2003). J. Appl. Cryst. 36, 1103.]); program(s) used to refine structure: SHELXL97 (Sheldrick, 2008[Sheldrick, G. M. (2008). Acta Cryst. A64, 112-122.]); molecular graphics: ORTEPIII (Burnett & Johnson, 1996[Burnett, M. N. & Johnson, C. K. (1996). ORTEPIII. Report ORNL-6895. Oak Ridge National Laboratory. Tennessee, USA.]); software used to prepare material for publication: CrystalStructure.


Supplementary data and figures for this paper are available from the IUCr electronic archives (Reference: BT2845 ).


Acknowledgements

The authors express their sincere thanks to Mr O. Yamate at Orient Chemical Industries, Ltd for the preparation of the sample.

References

Burla, M. C., Camalli, M., Carrozzini, B., Cascarano, G. L., Giacovazzo, C., Polidori, G. & Spagna, R. (2003). J. Appl. Cryst. 36, 1103.  [CrossRef] [details]
Burnett, M. N. & Johnson, C. K. (1996). ORTEPIII. Report ORNL-6895. Oak Ridge National Laboratory. Tennessee, USA.
Higashi, T. (1995). ABSCOR. Rigaku Corporation, Tokyo, Japan.
Mizuguchi, J., Sato, Y., Uta, K. & Sato, K. (2007). Acta Cryst. E63, o2509-o2510.  [CrossRef] [details]
Nash, R. J., Grande, M. L. & Muller, R. N. (2001). Proceedings of the 7th International Conference on Advances in Non-Impact Printing Technology, pp. 358-364.
Rigaku (1998). PROCESS-AUTO. Rigaku Corporation, Tokyo, Japan.
Rigaku/MSC (2006). CrystalStructure. Rigaku/MSC, The Woodlands, Texas, USA.
Sheldrick, G. M. (2008). Acta Cryst. A64, 112-122.  [CrossRef] [details]
Uta, K. & Mizuguchi, J. (2009). Acta Cryst. E65, o320.  [CSD] [CrossRef] [details]
Uta, K., Sato, Y. & Mizuguchi, J. (2009). Acta Cryst. E65, o319.  [CSD] [CrossRef] [details]


Acta Cryst (2009). E65, o321  [ doi:10.1107/S1600536809001056 ]

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