4-Meth­oxy-3-nitro­biphen­yl

Chao, X.; Zhang, X.; Wang, K.; Ji, J.; Chen, Q.

doi:10.1107/S1600536811052846

Volume 68
Part 1
Page o114
January 2012

Received 24 November 2011
Accepted 8 December 2011
Online 14 December 2011

Key indicators
Single-crystal X-ray study
T = 296 K
Mean (C-C) = 0.003 Å
R = 0.047
wR = 0.134
Data-to-parameter ratio = 13.3
Details

4-Methoxy-3-nitrobiphenyl

Xuqiang Chao,^a Xiuqin Zhang,^b Kai Wang,^b Jun Ji ^a and Qiang Chen ^b ^*

^aSchool of Petrochemical Engineering, Changzhou University, Changzhou 213164, Jiangsu, People's Republic of China, and ^bHigh Technology Research Institute of Nanjing University, Changzhou 213162, Jiangsu, People's Republic of China
Correspondence e-mail: cxq_cczu@163.com

In the title compound, C₁₃H₁₁NO₃, the dihedral angle between the two benzene rings is 36.69 (2)° and the nitro and methyoxy groups are oriented at 29.12 (14) and 2.14 (12)° with respect to the benzene ring to which they are bonded.

Related literature

For background information and the synthetic procedure, see: Pourali & Fatemi (2010). For the crystal structure of a similar compound, see: Marques et al. (2008).

Experimental

Crystal data

C₁₃H₁₁NO₃
M_r = 229.23
Orthorhombic, P b c a
a = 7.2464 (14) Å
b = 14.416 (3) Å
c = 21.270 (4) Å
V = 2221.9 (7) Å³
Z = 8
Mo K radiation
= 0.10 mm^-1
T = 296 K
0.20 × 0.18 × 0.15 mm

Data collection

Enraf-Nonius CAD-4 diffractometer
Absorption correction: scan (North et al., 1968) T_min = 0.981, T_max = 0.985
23696 measured reflections
2067 independent reflections
1767 reflections with I > 2(I)
R_int = 0.042
3 standard reflections every 200 reflections intensity decay: 1%

Refinement

R[F² > 2(F²)] = 0.047
wR(F²) = 0.134
S = 1.00
2067 reflections
155 parameters
H-atom parameters constrained
_max = 0.30 e Å^-3
_min = -0.21 e Å^-3

Data collection: CAD-4 Software (Enraf-Nonius, 1985); cell refinement: CAD-4 Software; data reduction: XCAD4 (Harms & Wocadlo, 1995); program(s) used to solve structure: SHELXS97 (Sheldrick, 2008); program(s) used to refine structure: SHELXL97 (Sheldrick, 2008); molecular graphics: SHELXTL (Sheldrick, 2008); software used to prepare material for publication: SHELXTL.

Supplementary data and figures for this paper are available from the IUCr electronic archives (Reference: PV2490 ).

Acknowledgements

The authors thank the Center of Testing and Analysis, Nanjing University, for the data collection.

References

Enraf-Nonius (1985). CAD-4 Software. Enraf-Nonius, Delft, The Netherlands.
Harms, K. & Wocadlo, S. (1995). XCAD4. University of Marburg, Germany.
Marques, A. T., Silva, J. A., Silva, M. R., Beja, A. M., Justino, L. L. G. & Sobral, A. J. F. N. (2008). J. Chem. Crystallogr. 38, 295-299.
North, A. C. T., Phillips, D. C. & Mathews, F. S. (1968). Acta Cryst. A24, 351-359.
Pourali, A. R. & Fatemi, F. (2010). Chin. Chem. Lett. 21, 1283-1286.
Sheldrick, G. M. (2008). Acta Cryst. A64, 112-122.

organic compounds