Journal of Applied Crystallography
Volume 25, Part 3 (June 1992)
J. Appl. Cryst. (1992). 25, 331-335 [doi:10.1107/S0021889891011433]
Line shifts in crystal powder diffractometers
M. Popovici and A. D. Stoica
J. Appl. Cryst. (1992). 25, 336-339 [doi:10.1107/S0021889891012372]
The application of cluster analysis in X-ray diffraction phase analysis
B. Liao and J. Chen
J. Appl. Cryst. (1992). 25, 340-347 [doi:10.1107/S0021889891012876]
An X-ray spectrometer with an energy resolution of 54 meV
W. Hofmann, J. Kalus and U. Schmelzer
J. Appl. Cryst. (1992). 25, 348-357 [doi:10.1107/S0021889891012955]
A high-speed data-collection system for large-unit-cell crystals using an imaging plate as a detector
M. Sato, M. Yamamoto, K. Imada, Y. Katsube, N. Tanaka and T. Higashi
J. Appl. Cryst. (1992). 25, 358-365 [doi:10.1107/S0021889891014048]
The effect of absorption on the integrated reflectivity of defective single crystals
P. D. Moran and R. J. Matyi
J. Appl. Cryst. (1992). 25, 366-371 [doi:10.1107/S0021889892000888]
Simulation of Renninger scans for heteroepitaxic layers
C. A. B. Salles da Costa, L. P. Cardoso, V. L. Mazzocchi and C. B. R. Parente
J. Appl. Cryst. (1992). 25, 372-376 [doi:10.1107/S0021889891014164]
Accurate determination of strain tensors from small shifts of reflections measured on a four-circle diffractometer
H. Graafsma
J. Appl. Cryst. (1992). 25, 377-383 [doi:10.1107/S0021889891014231]
Angular measurements with X-ray interferometry
D. Windisch and P. Becker
J. Appl. Cryst. (1992). 25, 384-390 [doi:10.1107/S002188989101422X]
The control of geometrical sources of error in X-ray diffraction applied to stress analysis
F. Convert and B. Miege
J. Appl. Cryst. (1992). 25, 391-399 [doi:10.1107/S0021889891014322]
Calculation of diffuse scattering from simulated disordered crystals: a comparison with optical transforms
B. D. Butler and T. R. Welberry
J. Appl. Cryst. (1992). 25, 400-408 [doi:10.1107/S0021889891014553]
Caractérisation de la texture de recristallisation primaire et de la spécialité des joints de grains de tôles de Fe-3%Si par diffraction des electrons
rétrodiffusés
T. Baudin, P. Paillard et R. Penelle
J. Appl. Cryst. (1992). 25, 409-413 [doi:10.1107/S0021889891014814]
On the apparent response of photographic emulsions according to least-squares determinations of the `blackness correction' from gas electron diffraction data
S. Gundersen, T. G. Strand and H. V. Volden
J. Appl. Cryst. (1992). 25, 414-423 [doi:10.1107/S0021889891014826]
Quantitive analysis of Laue diffraction patterns recorded with a 120 ps exposure from an X-ray undulator
D. M. E. Szebenyi, D. H. Bilderback, A. LeGrand, K. Moffat, W. Schildkamp, B. Smith Temple and T. Teng
J. Appl. Cryst. (1992). 25, 424-431 [doi:10.1107/S0021889892000116]
Precise X-ray relative measurement of lattice parameters of silicon wafers by multiple-crystal Bragg-case diffractometry. Computer simulation of the experiment
F. Cembali, R. Fabbri, M. Servidori, A. Zani, G. Basile, G. Cavagnero, A. Bergamin and G. Zosi
J. Appl. Cryst. (1992). 25, 432-438 [doi:10.1107/S0021889892000839]
Bent-crystal monochromator for 150 keV synchrotron radiation
P. Suortti, D. Chapman, J. R. Schneider and T. Tschentscher
J. Appl. Cryst. (1992). 25, 439 [doi:10.1107/S0021889892003091]
Influence of first-order approximations in the incidence parameter on the simulation of symmetric and asymmetric X-ray rocking curves of heteroepitactic structures. Erratum
M. Servidori, F. Cembali, R. Fabbri and A. Zani
J. Appl. Cryst. (1992). 25, 440-443 [doi:10.1107/S0021889891015157]
A Laue diffractometer with
geometry
J. Lange and H. Burzlaff
J. Appl. Cryst. (1992). 25, 443-447 [doi:10.1107/S0021889891013389]
FOURDEM: a program written as an aid to teaching the elements of Fourier synthesis and other crystallographic concepts
T. R. Welberry and K. Owen
J. Appl. Cryst. (1992). 25, 447-451 [doi:10.1107/S0021889891013122]
MRIA - a program for a full profile analysis of powder multiphase neutron-diffraction time-of-flight (direct and Fourier) spectra
V. B. Zlokazov and V. V. Chernyshev
J. Appl. Cryst. (1992). 25, 451-454 [doi:10.1107/S0021889891014243]
Software and methods for precise X-ray analysis
V. V. Chernyshev, G. V. Fetisov, A. V. Laktionov, V. T. Markov, A. P. Nesterenko and S. G. Zhukov
J. Appl. Cryst. (1992). 25, 455-459 [doi:10.1107/S0021889892000384]
DIFRAC, single-crystal diffractometer output-conversion software
H. D. Flack, E. Blanc and D. Schwarzenbach
J. Appl. Cryst. (1992). 25, 459-462 [doi:10.1107/S0021889892001122]
LSI - a computer program for simultaneous refinement of material structure and microstructure
L. Lutterotti, P. Scardi and P. Maistrelli
J. Appl. Cryst. (1992). 25, 463 [doi:10.1107/S0021889892003777]
Crystallographers
J. Appl. Cryst. (1992). 25, 463-464 [doi:10.1107/S0021889892000797]
High-resolution transmission electron microscopy edited by P. Buseck, J. Cowley and L. Eyring
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