Contrast matching of an Si substrate with polymer films by anomalous dispersion at the Si K absorption edge

Okuda, H.; Takeshita, K.; Ochiai, S.; Kitajima, Y.; Sakurai, S.; Ogawa, H.

doi:10.1107/S002188981105206X

Figure 2
GISAXS patterns measured with X-rays with photon energies of (a) 12.4 keV, (b) 1.770 keV and (c) 1.837 keV. The positions marked by broken lines correspond to calculated (1) k_i^z + k_c^z(Si) and (2) k_i^z + k_c^z(SEBS) and (3) both.