
Figure 2
Scattering images of lamellartype silicon nanostructures at incident angles of (a) 0.10°, (b) 0.16° and (c) 0.50°. The direct beam position and the surface horizon position are denoted by dotted and solid lines, respectively. (d) A SEM image of the silicon nanostructure. The inset shows the crosssectional SEM image. (e) Scattering profiles for the firstorder BRs, obtained from the boxed regions in (a)(c). 