J. Appl. Cryst. (2013). 46, 1569-1575 [ doi:10.1107/S0021889813022905 ]
Abstract: Resonant X-ray reflectivity can combine the layer sensitivity of the reflectivity technique with the chemical composition sensitivity of the absorption technique. The idea is demonstrated through a depth profile study of the chemical composition of a multi-element thin-film system at the soft X-ray spectral range near the boron K absorption edge. The composition profile of a multi-element low-contrast (<0.6%) thin film is determined from the free surface to buried interfaces within a few atomic percentages of precision and with a nanometre depth resolution.
Keywords: interface structure and roughness; resonant X-ray reflectivity; composition and phase identification.
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