Diffraction stress analysis of highly planar-faulted, macroscopically elastically anisotropic thin films and application to tensilely loaded nanocrystalline Ni and Ni(W)

Kurz, S.J.B.; Welzel, U.; Bischoff, E.; Mittemeijer, E.J.

doi:10.1107/S1600576713030756

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 7
∊–sin²Ψ plot for the Ni(W)–wafer film, using the CGM at the rotation angle φ = 0°. The measured strain of the unaffected reflections depends linearly on sin²Ψ [cf. equation (3)

], whereas the measured strains of the affected reflections deviate strikingly and irregularly from this linear dependence.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 47| Part 1| February 2014| Pages 291-302

doi:10.1107/S1600576713030756

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