Figure 5
Si L2,3 XANES for SiOx/Si(100) structures with nc-Si. SiOx: initial film. N0: film without implantation and after annealing. N1: film after implantation with a dose of 6 × 1016 cm-2 and following annealing. N2: film after implantation with a dose of 9 × 1016 cm-2 and following annealing. N3: film after implantation with a dose of 1.2 × 1017 cm-2 and following annealing.  [article HTML]

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