J. Synchrotron Rad. (2014). 21, 300-314 [ doi:10.1107/S1600577513032402 ]
Abstract: Although the graphitic carbon contamination of synchrotron beamline optics has been an obvious problem for several decades, the basic mechanisms underlying the contamination process as well as the cleaning/remediation strategies are not understood and the corresponding cleaning procedures are still under development. In this study an analysis of remediation strategies all based on in situ low-pressure RF plasma cleaning approaches is reported, including a quantitative determination of the optimum process parameters and their influence on the chemistry as well as the morphology of optical test surfaces. It appears that optimum results are obtained for a specific pressure range as well as for specific combinations of the plasma feedstock gases, the latter depending on the chemical aspects of the optical surfaces to be cleaned.
Keywords: synchrotron optics; carbon contamination; low-pressure RF plasma; X-ray photoemission spectroscopy; optical emission spectroscopy; interference microscopy.
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