Figure 4
Projection of the Si(N,O)4 tetrahedral arrangement of the cubic low-pressure phase of Ce4[Si4O3 + xN7 −x]Cl1 − xOx, x ≃ 0.2, at 8.5 GPa and of the orthorhombic high-pressure phase at 8.6 GPa. The strong bending of some inter-polyhedral Si—N—Si angles is also shown. Ce atoms and the mixed Cl/O2 positions are not drawn. |