Structure variations within RSi2 and R2Si3 silicides. Part II. Structure driving factors

Nentwich, M.; Zschornak, M.; Sonntag, M.; Gumeniuk, R.; Gemming, S.; Leisegang, T.; Meyer, D. C.

doi:10.1107/S2052520620003893

Acta Crystallographica Section B
Acta Crystallographica
Section B STRUCTURAL SCIENCE, CRYSTAL ENGINEERING AND MATERIALS

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Figure 14
Snapshot of the distribution of delocalized single and double bonds in AlB₂-like RSi₂ and ordered R₂TSi₃ compounds. (a) RSi₂ compounds and (b) ordered R₂TSi₃ compounds. These figures only include the Si/T sublayers. The unit cell of the minimal structure pattern of ordered R₂TSi₃ compounds is highlighted in blue and the isolated Si hexagon is highlighted in red. Dashed arrows indicate the coordinative bonds between Si and T atoms.

STRUCTURAL SCIENCE
CRYSTAL ENGINEERING
MATERIALS

ISSN: 2052-5206

Volume 76| Part 3| June 2020| Pages 378-410

https://doi.org/10.1107/S2052520620003893

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