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Figure 2
Mutually exclusive motifs A and B identified by Gelbrich & Hursthouse (2006BB32). Motif A is found in polymorphs I and II. Motif B is found in polymorphs III and IV. Motif B* is an offset version of B, occurring in CBZ·DMA and CBZ·BZQ.

Journal logoSTRUCTURAL SCIENCE
CRYSTAL ENGINEERING
MATERIALS
ISSN: 2052-5206
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