Elastic and inelastic strain in submicron-thick ZnO epilayers grown on r-sapphire substrates by metal–organic vapour phase deposition

Martinez-Tomas, M.C.; Klymov, O.; Shimazoe, K.; Sánchez-Royo, J.-F.; Changarath, M. E.; Agouram, S.; Muñoz-Sanjosé, V.

doi:10.1107/S2052520624000441

Acta Crystallographica Section B
Acta Crystallographica
Section B STRUCTURAL SCIENCE, CRYSTAL ENGINEERING AND MATERIALS

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Figure 7
For a ZnO film with a thickness of 12 nm: (a) EDX spectrum, (b) HRTEM image of basal plane, (c) HRTEM image of a prismatic plane. For a ZnO film with a thickness of 770 nm: (d) EDX spectrum, (e) HRTEM image of basal plane, (f) HRTEM image of a prismatic plane. The insets are the FFT of the selected area in the HRTEM images.

STRUCTURAL SCIENCE
CRYSTAL ENGINEERING
MATERIALS

ISSN: 2052-5206

Volume 80| Part 2| April 2024| Pages 72-83

https://doi.org/10.1107/S2052520624000441

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