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Figure 1
Schematic design and distance indications of the undulator source and optics. A, low-β undulator source; B, primary slits; C, double Si(111) monochromator; D, secondary slits in front of a Kirkpatrick–Baez (KB) mirror; E1 and E2, KB mirrors; F: micromanipulator and goniometer. The size and divergence of the beam at the undulator source point and at the focal spot are symbolized by squares. The distance from the source and the beam divergence are indicated.

Journal logoBIOLOGICAL
CRYSTALLOGRAPHY
ISSN: 1399-0047
Volume 64| Part 2| January 2008| Pages 158-166
doi:10.1107/S090744490705812X
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