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Figure 5
Single scatter plasmon intensity distribution for a 500 Å-thick Si [001] specimen simulated using (a) physical optics Bloch wave and (b) multislice methods. In (c) the intensity profile along the 220 reciprocal direction is compared for each simulation. The intensity was extracted from the annotated box region shown in (a). The unscattered beam is at the origin of the graph and is normalized for a direct visual comparison. |