organic compounds
4-Methoxy-3-(trifluoromethyl)aniline
aCollege of Chemical and Biological Engineering, Yancheng Institute of Technology, Yinbing Road No. 9 Yancheng, Yancheng 224051, People's Republic of China
*Correspondence e-mail: jlheyc@163.com
In title compound, C8H8F3NO, the methoxy group is inclined at 8.7 (4)° to the benzene ring plane. The is stabilized by intermolecular N—H⋯F, N—H⋯N and C—H⋯F hydrogen-bonding interactions.
Related literature
The title compound is an intermediate in the synthesis of trifluoromethyl-containing phthalic acid diamides, which are effective pesticides. For the preparation, see: Feng & Li (2010). For the of a closely related compound, see: Crampton et al. (2006).
Experimental
Crystal data
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Refinement
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Data collection: CAD-4 Software (Enraf–Nonius, 1985); cell CAD-4 Software; data reduction: XCAD4 (Harms & Wocadlo, 1995); program(s) used to solve structure: SHELXS97 (Sheldrick, 2008); program(s) used to refine structure: SHELXL97 (Sheldrick, 2008); molecular graphics: SHELXTL (Sheldrick, 2008); software used to prepare material for publication: SHELXTL.
Supporting information
10.1107/S160053681200030X/pv2499sup1.cif
contains datablocks I, global. DOI:Structure factors: contains datablock I. DOI: 10.1107/S160053681200030X/pv2499Isup2.hkl
Supporting information file. DOI: 10.1107/S160053681200030X/pv2499Isup3.cml
The title compound was prepared by a method reported in the literature (Feng & Li, 2010)). A solution of 4-amino-2-(trifluoromethyl)phenol (2 g, 11.3 mmol) in dichloromethane (20 ml) was added slowly to a solution of sodium hydride (0.33 g, 13.6 nmol) in an ice bath. After stirring for 6 h iodomethane (4.8 g, 33.9 mmol) was added slowly in 1 h. After stirring for 48 h at room tempeature, the solvent was evaporated on a rotary evaporator yielding the title compound. Colorless blocks of the title compound were grown in ethanol (20 ml) by slow evaporation of the solvent at room temperature in about 7 days.
The H atoms were positioned geometrically and constrained to ride on their parent atoms, with N—H = 0.86 Å and C—H = 0.93 and 0.96 Å for aryl and alky H-atoms, respectively, with Uiso(H) = xUeq(C/N), where x = 1.2 for aromatic and amino H, and x = 1.5 for aryl H atoms.
Data collection: CAD-4 Software (Enraf–Nonius, 1985); cell
CAD-4 Software (Enraf–Nonius, 1985); data reduction: XCAD4 (Harms & Wocadlo, 1995); program(s) used to solve structure: SHELXS97 (Sheldrick, 2008); program(s) used to refine structure: SHELXL97 (Sheldrick, 2008); molecular graphics: SHELXTL (Sheldrick, 2008); software used to prepare material for publication: SHELXTL (Sheldrick, 2008).C8H8F3NO | F(000) = 784 |
Mr = 191.15 | Dx = 1.480 Mg m−3 |
Orthorhombic, Pbca | Mo Kα radiation, λ = 0.71073 Å |
Hall symbol: -P 2ac 2ab | Cell parameters from 25 reflections |
a = 5.4140 (11) Å | θ = 3.3–20.0° |
b = 14.880 (3) Å | µ = 0.14 mm−1 |
c = 21.304 (4) Å | T = 293 K |
V = 1716.3 (6) Å3 | Prism, colorless |
Z = 8 | 0.10 × 0.10 × 0.10 mm |
Enraf–Nonius CAD-4 diffractometer | 1722 independent reflections |
Radiation source: fine-focus sealed tube | 1389 reflections with I > 2σ(I) |
Graphite monochromator | Rint = 0.000 |
Detector resolution: 28.5714 pixels mm-1 | θmax = 26.4°, θmin = 3.3° |
ω/2θ scans | h = 0→6 |
Absorption correction: ψ scan (North et al., 1968) | k = 0→18 |
Tmin = 0.986, Tmax = 0.986 | l = 0→26 |
1722 measured reflections |
Refinement on F2 | Primary atom site location: structure-invariant direct methods |
Least-squares matrix: full | Secondary atom site location: difference Fourier map |
R[F2 > 2σ(F2)] = 0.059 | Hydrogen site location: inferred from neighbouring sites |
wR(F2) = 0.162 | H-atom parameters constrained |
S = 1.13 | w = 1/[σ2(Fo2) + (0.074P)2 + 0.3348P] where P = (Fo2 + 2Fc2)/3 |
1722 reflections | (Δ/σ)max < 0.001 |
118 parameters | Δρmax = 0.20 e Å−3 |
0 restraints | Δρmin = −0.19 e Å−3 |
C8H8F3NO | V = 1716.3 (6) Å3 |
Mr = 191.15 | Z = 8 |
Orthorhombic, Pbca | Mo Kα radiation |
a = 5.4140 (11) Å | µ = 0.14 mm−1 |
b = 14.880 (3) Å | T = 293 K |
c = 21.304 (4) Å | 0.10 × 0.10 × 0.10 mm |
Enraf–Nonius CAD-4 diffractometer | 1722 independent reflections |
Absorption correction: ψ scan (North et al., 1968) | 1389 reflections with I > 2σ(I) |
Tmin = 0.986, Tmax = 0.986 | Rint = 0.000 |
1722 measured reflections |
R[F2 > 2σ(F2)] = 0.059 | 0 restraints |
wR(F2) = 0.162 | H-atom parameters constrained |
S = 1.13 | Δρmax = 0.20 e Å−3 |
1722 reflections | Δρmin = −0.19 e Å−3 |
118 parameters |
Geometry. All e.s.d.'s (except the e.s.d. in the dihedral angle between two l.s. planes) are estimated using the full covariance matrix. The cell e.s.d.'s are taken into account individually in the estimation of e.s.d.'s in distances, angles and torsion angles; correlations between e.s.d.'s in cell parameters are only used when they are defined by crystal symmetry. An approximate (isotropic) treatment of cell e.s.d.'s is used for estimating e.s.d.'s involving l.s. planes. |
Refinement. Refinement of F2 against ALL reflections. The weighted R-factor wR and goodness of fit S are based on F2, conventional R-factors R are based on F, with F set to zero for negative F2. The threshold expression of F2 > σ(F2) is used only for calculating R-factors(gt) etc. and is not relevant to the choice of reflections for refinement. R-factors based on F2 are statistically about twice as large as those based on F, and R- factors based on ALL data will be even larger. |
x | y | z | Uiso*/Ueq | ||
N | 0.0910 (3) | 0.09833 (11) | 0.20799 (9) | 0.0642 (5) | |
H0A | 0.1826 | 0.0524 | 0.2003 | 0.077* | |
H0B | 0.0020 | 0.0998 | 0.2414 | 0.077* | |
F3 | −0.3126 (4) | 0.39455 (11) | 0.21116 (7) | 0.1021 (6) | |
F2 | −0.3656 (3) | 0.42452 (10) | 0.11387 (8) | 0.0906 (5) | |
C7 | −0.0486 (4) | 0.32133 (13) | 0.13969 (9) | 0.0548 (5) | |
F1 | −0.0537 (3) | 0.47609 (9) | 0.16277 (8) | 0.0924 (6) | |
O | 0.0805 (4) | 0.39518 (12) | 0.04733 (8) | 0.0872 (6) | |
C6 | −0.0515 (4) | 0.24725 (13) | 0.17919 (10) | 0.0550 (5) | |
H6A | −0.1479 | 0.2487 | 0.2153 | 0.066* | |
C5 | 0.0868 (4) | 0.17085 (13) | 0.16592 (9) | 0.0557 (5) | |
C8 | −0.1937 (4) | 0.40274 (15) | 0.15659 (10) | 0.0643 (6) | |
C2 | 0.0907 (4) | 0.32022 (15) | 0.08453 (10) | 0.0653 (6) | |
C4 | 0.2268 (5) | 0.17158 (16) | 0.11146 (11) | 0.0719 (7) | |
H4A | 0.3216 | 0.1214 | 0.1016 | 0.086* | |
C3 | 0.2297 (5) | 0.24452 (18) | 0.07140 (11) | 0.0767 (7) | |
H3A | 0.3260 | 0.2427 | 0.0353 | 0.092* | |
C1 | 0.2463 (6) | 0.4017 (2) | −0.00398 (11) | 0.0865 (8) | |
H1A | 0.2177 | 0.4570 | −0.0260 | 0.130* | |
H1B | 0.2203 | 0.3520 | −0.0319 | 0.130* | |
H1C | 0.4131 | 0.4005 | 0.0113 | 0.130* |
U11 | U22 | U33 | U12 | U13 | U23 | |
N | 0.0752 (12) | 0.0474 (10) | 0.0699 (11) | 0.0025 (8) | 0.0031 (9) | 0.0081 (8) |
F3 | 0.1383 (15) | 0.0767 (10) | 0.0912 (11) | 0.0339 (10) | 0.0413 (10) | 0.0151 (8) |
F2 | 0.0887 (10) | 0.0811 (11) | 0.1018 (11) | 0.0177 (8) | −0.0227 (9) | 0.0065 (8) |
C7 | 0.0605 (11) | 0.0477 (11) | 0.0562 (11) | −0.0037 (9) | −0.0035 (10) | 0.0018 (8) |
F1 | 0.1106 (12) | 0.0541 (8) | 0.1124 (12) | −0.0104 (8) | −0.0073 (9) | −0.0123 (7) |
O | 0.1094 (14) | 0.0758 (11) | 0.0763 (11) | 0.0142 (10) | 0.0150 (10) | 0.0304 (9) |
C6 | 0.0620 (12) | 0.0492 (11) | 0.0539 (11) | −0.0033 (9) | 0.0009 (10) | 0.0014 (8) |
C5 | 0.0625 (12) | 0.0482 (11) | 0.0563 (11) | −0.0046 (9) | −0.0058 (10) | 0.0021 (8) |
C8 | 0.0757 (15) | 0.0539 (12) | 0.0632 (12) | 0.0042 (10) | 0.0003 (11) | 0.0069 (10) |
C2 | 0.0782 (14) | 0.0604 (13) | 0.0572 (12) | 0.0005 (11) | 0.0006 (11) | 0.0119 (10) |
C4 | 0.0852 (16) | 0.0629 (14) | 0.0674 (13) | 0.0141 (12) | 0.0126 (13) | 0.0032 (10) |
C3 | 0.0922 (17) | 0.0765 (16) | 0.0614 (13) | 0.0136 (13) | 0.0179 (13) | 0.0116 (11) |
C1 | 0.0955 (18) | 0.0942 (19) | 0.0697 (15) | −0.0139 (15) | 0.0077 (15) | 0.0258 (14) |
N—C5 | 1.403 (3) | C6—C5 | 1.390 (3) |
N—H0A | 0.8600 | C6—H6A | 0.9300 |
N—H0B | 0.8600 | C5—C4 | 1.386 (3) |
F3—C8 | 1.335 (3) | C2—C3 | 1.383 (3) |
F2—C8 | 1.342 (3) | C4—C3 | 1.381 (3) |
C7—C6 | 1.387 (3) | C4—H4A | 0.9300 |
C7—C2 | 1.396 (3) | C3—H3A | 0.9300 |
C7—C8 | 1.488 (3) | C1—H1A | 0.9600 |
F1—C8 | 1.335 (3) | C1—H1B | 0.9600 |
O—C2 | 1.369 (3) | C1—H1C | 0.9600 |
O—C1 | 1.418 (3) | ||
C5—N—H0A | 120.0 | F1—C8—C7 | 112.9 (2) |
C5—N—H0B | 120.0 | F2—C8—C7 | 113.50 (19) |
H0A—N—H0B | 120.0 | O—C2—C3 | 124.6 (2) |
C6—C7—C2 | 120.48 (19) | O—C2—C7 | 117.1 (2) |
C6—C7—C8 | 119.62 (19) | C3—C2—C7 | 118.27 (19) |
C2—C7—C8 | 119.89 (18) | C3—C4—C5 | 122.0 (2) |
C2—O—C1 | 118.4 (2) | C3—C4—H4A | 119.0 |
C7—C6—C5 | 121.37 (19) | C5—C4—H4A | 119.0 |
C7—C6—H6A | 119.3 | C4—C3—C2 | 120.6 (2) |
C5—C6—H6A | 119.3 | C4—C3—H3A | 119.7 |
C4—C5—C6 | 117.27 (18) | C2—C3—H3A | 119.7 |
C4—C5—N | 122.13 (19) | O—C1—H1A | 109.5 |
C6—C5—N | 120.53 (19) | O—C1—H1B | 109.5 |
F3—C8—F1 | 105.23 (19) | H1A—C1—H1B | 109.5 |
F3—C8—F2 | 106.14 (19) | O—C1—H1C | 109.5 |
F1—C8—F2 | 105.25 (18) | H1A—C1—H1C | 109.5 |
F3—C8—C7 | 113.03 (18) | H1B—C1—H1C | 109.5 |
D—H···A | D—H | H···A | D···A | D—H···A |
C1—H1C···F2i | 0.96 | 2.52 | 3.292 (3) | 138 |
C6—H6A···F3 | 0.93 | 2.35 | 2.696 (3) | 102 |
N—H0A···F1ii | 0.86 | 2.44 | 3.242 (2) | 155 |
N—H0B···Niii | 0.86 | 2.47 | 3.245 (3) | 150 |
Symmetry codes: (i) x+1, y, z; (ii) −x+1/2, y−1/2, z; (iii) x−1/2, y, −z+1/2. |
Experimental details
Crystal data | |
Chemical formula | C8H8F3NO |
Mr | 191.15 |
Crystal system, space group | Orthorhombic, Pbca |
Temperature (K) | 293 |
a, b, c (Å) | 5.4140 (11), 14.880 (3), 21.304 (4) |
V (Å3) | 1716.3 (6) |
Z | 8 |
Radiation type | Mo Kα |
µ (mm−1) | 0.14 |
Crystal size (mm) | 0.10 × 0.10 × 0.10 |
Data collection | |
Diffractometer | Enraf–Nonius CAD-4 diffractometer |
Absorption correction | ψ scan (North et al., 1968) |
Tmin, Tmax | 0.986, 0.986 |
No. of measured, independent and observed [I > 2σ(I)] reflections | 1722, 1722, 1389 |
Rint | 0.000 |
(sin θ/λ)max (Å−1) | 0.625 |
Refinement | |
R[F2 > 2σ(F2)], wR(F2), S | 0.059, 0.162, 1.13 |
No. of reflections | 1722 |
No. of parameters | 118 |
H-atom treatment | H-atom parameters constrained |
Δρmax, Δρmin (e Å−3) | 0.20, −0.19 |
Computer programs: CAD-4 Software (Enraf–Nonius, 1985), XCAD4 (Harms & Wocadlo, 1995), SHELXS97 (Sheldrick, 2008), SHELXL97 (Sheldrick, 2008), SHELXTL (Sheldrick, 2008).
D—H···A | D—H | H···A | D···A | D—H···A |
C1—H1C···F2i | 0.96 | 2.52 | 3.292 (3) | 138 |
N—H0A···F1ii | 0.86 | 2.44 | 3.242 (2) | 155 |
N—H0B···Niii | 0.86 | 2.47 | 3.245 (3) | 150 |
Symmetry codes: (i) x+1, y, z; (ii) −x+1/2, y−1/2, z; (iii) x−1/2, y, −z+1/2. |
Acknowledgements
The author thanks the Center of Testing and Analysis, Nanjing University, for the data collection.
References
Crampton, M. R., Emokpae, T. A., Isanbor, C., Batsanov, A. S., Howard, J. A. K. & Mondal, R. (2006). Eur. J. Org. Chem. pp. 1222–1230. Web of Science CSD CrossRef Google Scholar
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Feng, M. L. & Li, Y. F. (2010). J. Agric. Food Chem. 58, 10999–11006. Web of Science CrossRef CAS PubMed Google Scholar
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The tittle compound (Fig. 1) is used as an important intermediate in the synthesis of trifluoromethyl-containing phthalic acid compounds which are recognized as effective pesticides (Feng & Li, 2010). In the title molecule, the N, O and C8 atoms bonded to the central benzene ring (C2–C7) lie in its plane with methoxy group (O/C1) oriented at 8.7 (4) ° with respect to the benzene ring plane. There is an intramolecular interaction C6—H6A···F3 which stabilizes the molecular structure of the title compound. The crystal structure is stabilized by N—H0A···F1, N—H0B···N and C1—H1C···F2 intermolecular hydrogen bonding interactions. The bond distances and bond angles in the title compound agree with the corresponding bond distances and bond angles reported in a closely related compound (Crampton et al., 2006).