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Figure 5
A section of the observed diffraction pattern for sample 3 collected using Cu Kα X-rays. Note the presence of the increased pattern background between 15 and 30° 2θ caused by the presence of amorphous material in the sample.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 35| Part 4| July 2002| Pages 383-400
doi:10.1107/S0021889802008798
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