Journal of Applied Crystallography
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Figure 6
Statistics for HEWL [Mo
K
α
(dot-dashed line), Cu
K
α
(dotted line), 1.488 Å synchrotron (dashed line) and 2.0 Å synchrotron (full line), 486 images]:
versus
resolution (
a
);
N
ref
versus
resolution (
b
).
JOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 37
|
Part 4
|
July 2004
|
Pages 555-564
doi:10.1107/S0021889804010052
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