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Figure 1
(a) Photograph of a hemispherically deformed crystal used in the measurement showing the two measured directions. An ω scan profile at x = 10 mm from the sample centre in direction B is shown. (b) Shift of the 333 Bragg peak position and the FWHM of the peak in ω scans of hemispherically and cylindrically deformed Si wafers as a function of translation distance of the sample, x.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 39| Part 3| May 2006| Pages 443-445
doi:10.1107/S0021889806011939
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