Journal of Applied Crystallography
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Figure 2
Relationship between the measured peak shift and the calculated peak shift for hemispherical Si wafers deformed to various radii of curvature.
JOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 39
|
Part 3
|
May 2006
|
Pages 443-445
doi:10.1107/S0021889806011939
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