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Figure 1
Surface electronic micrograph (SEM) of a LOFO sample irradiated with 3 × 108 Xe ions cm−2, UV treated and etched for 5 min in 5 M NaOH at 333 K (courtesy of S. Poissonnet and P. Bonnaillie, DMN/SRMP, CEA-Saclay). |
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Figure 1
Surface electronic micrograph (SEM) of a LOFO sample irradiated with 3 × 108 Xe ions cm−2, UV treated and etched for 5 min in 5 M NaOH at 333 K (courtesy of S. Poissonnet and P. Bonnaillie, DMN/SRMP, CEA-Saclay). |