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Figure 1
GISAXS images of ULK samples after curing, resulting from different processes: (a) spin coating with as sacrificed porogen (SC-Po2); (b) self-assembled (SC-SA); (c) nanoclustering (SC-NC) or by (d) PECVD1 (electron beam cured), (e) PECVD2, (f) PECVD3, (g) PECVD4 (same composition as PECVD1, but ultra-violet cured).

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 40| Part s1| December 2007| Pages s363-s366
doi:10.1107/S0021889806053180
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