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Figure 5
(a) XR curves around the two critical angles αc,f and αc,s measured for the SiOCH films deposited with various BTMSM flow rate ratios (Rfr) and subsequently annealed at 673 K. (b) XR curves around αc,f and αc,s measured for the SiOCH films deposited with Rfr = 85% and subsequently annealed at various temperatures. The symbols are the measured data and the solid line represents the fit curve.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 40| Part s1| December 2007| Pages s614-s619
doi:10.1107/S0021889806054124
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