view article
Figure 4
The normalized applied strain [\bar \varepsilon\, _{hkl}^{\rm ap} = \left(\Delta d /d \right)_{hkl} / \left(\Delta d / d \right)_{hkl}^{\max P}], plotted as a function of pressure for nano-Ni (red lines) and micron-Ni (blue lines) during loading (solid lines) and unloading (dashed lines). For both panels, the plotted lines represent the averaged strains [\bar \varepsilon] derived from four different lattice planes, (111), (200), (220) and (311). The average strains at the highest pressures, Pmax, are listed in the inserts.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 41| Part 6| November 2008| Pages 1095-1108
doi:10.1107/S0021889808031762
Follow J. Appl. Cryst.
Sign up for e-alerts
E-alerts
Follow J. Appl. Cryst. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS