Odd electron diffraction patterns in silicon nanowires and silicon thin films explained by microtwins and nanotwins

Cayron, C.; Den Hertog, M.; Latu-Romain, L.; Mouchet, C.; Secouard, C.; Rouviere, J.-L.; Rouviere, E.; Simonato, J.-P.

doi:10.1107/S0021889808042131

Journal of Applied Crystallography Journal of Applied
Crystallography

IUCr IT WDC

home archive editors for authors for readers submit subscribe open access

view article

Figure 13
HRTEM image of a trench of a twinned Si NW prepared by FIB cross section. The zone axis is [01 $[\overline 1]$ ]; it is also the NW growth direction. The main interface plane between the matrix and its twin is the common (111) plane. A twin stops freely on a surface constituted of edges on the common ( $[\overline 2]$ 11) planes.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 42| Part 2| January 2009| Pages 242-252

doi:10.1107/S0021889808042131

Follow J. Appl. Cryst.

Search IUCr Journals		doi		Advanced search
Author		volume	page