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Figure 2
Parameterization of scattering in the (a) hk0 plane and (b) hhl plane (left part of panels) compared with the calculated scattering from real-space patterns (right part of panels). Eight clusters are generated as described in the text; Laue symmetry is applied to the scattering intensity.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 45| Part 6| December 2012| Pages 1309-1313
https://doi.org/10.1107/S0021889812039015
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