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Figure 2
Integrated intensity line plot along Qz of the symmetric RSM around the 004 Si Bragg peak, together with the Takagi–Taupin fit for the N = 10 period sample (integration along Qx). The inset shows the asymmetric RSM around the 224 Si Bragg peak together with the SiGe relaxation triangle. The position of the Si substrate peak, as well as the zeroth-order SL peak (SL0) which coincides with the second step of the virtual substrate, is labeled. The coherent growth of the superlattice on the two-step graded buffer with final Ge content of 82.7 (5)% is confirmed. In the simulation the grading from the first to the second step of the virtual substrate has not been included for simplicity.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 48| Part 1| February 2015| Pages 262-268
https://doi.org/10.1107/S1600576715000849
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