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![[Figure 2]](zr5001fig2mag.jpg)
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Figure 2
High-resolution (a) and low-resolution (b) Φ scans measured at 2Θ = 32.98°, the position of the Si 200 reflection. |
![[Figure 2]](zr5001fig2.jpg)
 | JOURNAL OF APPLIED CRYSTALLOGRAPHY |
ISSN: 1600-5767
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Figure 2
High-resolution (a) and low-resolution (b) Φ scans measured at 2Θ = 32.98°, the position of the Si 200 reflection. |
| JOURNAL OF APPLIED CRYSTALLOGRAPHY |
