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![[Figure 6]](zr5001fig6mag.jpg)
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Figure 6
Φ scan measured at 2Θ = 58.86°, the position of the Si 222 reflection (a), and 2Θ–Φ mapping of the Si 222 reflection near the ![[[{\overline 1}11]]](teximages/zr5001fi1.gif) in-plane direction (b) measured in high-resolution mode. |
![[Figure 6]](zr5001fig6.jpg)
 | JOURNAL OF APPLIED CRYSTALLOGRAPHY |
ISSN: 1600-5767
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Figure 6
Φ scan measured at 2Θ = 58.86°, the position of the Si 222 reflection (a), and 2Θ–Φ mapping of the Si 222 reflection near the in-plane direction (b) measured in high-resolution mode. |
| JOURNAL OF APPLIED CRYSTALLOGRAPHY |
