Characterization of defects in mono-like silicon for photovoltaic applications using X-ray Bragg diffraction imaging

Tsoutsouva, M.G.; Oliveira, V.A.; Baruchel, J.; Camel, D.; Marie, B.; Lafford, T.A.

doi:10.1107/S1600576715004926

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 10
Peak position and integrated intensity section maps of the Si 004 reflection at the junction between the two seeds. $[\bf h]$ is the projection of the diffraction vector onto the plane of the figure.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 48| Part 3| June 2015| Pages 645-654

https://doi.org/10.1107/S1600576715004926

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