view article
Figure 1
Electron diffraction patterns of top-view samples of the Ni and Ni(W) films. The intensity rings are indicated with the corresponding hkl. The weak intensity ring between {200}fcc and {220}fcc in (a) can be explained by diffraction from {220} planes of an NiO phase (all other expected NiO reflections are overlapping with Ni reflections or the high background intensity near the transmitted beam). For (b)–(d) the given hkls are compatible with a [111]fcc zone/electron beam axis. Rings pertaining to fractional hkls occur for all Ni(W) films owing to the presence of planar faults associated with diffuse intensity forming cylinders in reciprocal space. See text for explanation.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 48| Part 6| December 2015| Pages 1921-1926
doi:10.1107/S1600576715018919
Follow J. Appl. Cryst.
Sign up for e-alerts
E-alerts
Follow J. Appl. Cryst. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS