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Figure 7
(a) GISAXS pattern and (b) its lateral profile measured on the ion-beam-etched silicon grating with the Ge(111) compressor. The hatched area is the shadow of the beam stop protecting the Pilatus detector against the specularly reflected beam.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 49| Part 6| December 2016| Pages 1885-1892
https://doi.org/10.1107/S1600576716013376
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