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Figure 6
(a) SXPD pattern of CeO2 powder standard and Rietveld refinement (main plot) produced from the two-dimensional pattern (inset). The measurement was performed using a beam of 25 keV [λ = 0.49466 (1) Å] and 60 s exposure time. (b) SXPD pattern of CeO2 powder standard and the refinement obtained using a beam of E = 30 keV [λ = 0.41100 (5) Å] and 300 s exposure time. |
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