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Figure 4
Measured (black data) and calculated (smooth solid lines) patterns of a vanadium thin film (8.4 nm). The calculation was performed using the variable strain relaxation models that are specified in the legend. Curves are shifted vertically for clarity. Inset: strained interplanar spacing (d) versus the ordinal number of the unit cell counting from the substrate (N = 0) towards the air (N = 27).

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 50| Part 1| February 2017| Pages 288-292
https://doi.org/10.1107/S1600576716018379
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