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Figure 3
ω–2θ scans for Si(004) (coherent part of scattering): (1) as-implanted sample, (2) sample annealed at 853 K and (3) sample annealed at 1073 K.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 50| Part 2| April 2017| Pages 539-546
https://doi.org/10.1107/S1600576717003259
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