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Figure 5
Topograms of Cd1−xHgxTe/CdTe (111) epitaxial layers, obtained with the skew-asymmetric 115 reflection of Cu [{K{\alpha_{ 1,2}}}]. Region I is not implanted, region II is implanted with dose D1, and region III is implanted with dose D1 + D2. (a) [{L_{\rm ext}} \simeq 5.82 ] µm (φ = 90°); (b) [{L_{\rm ext}} \simeq 2.61] µm (φ = 30°); (c) [{L_{\rm ext}} \simeq 1.42] µm (φ = 20°).

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 50| Part 3| June 2017| Pages 727-733
https://doi.org/10.1107/S1600576717007208
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