view article
Figure 6
A thin layer (5 nm) of Si0.4Ge0.6 on an Si substrate. Reflection 004. Symmetric scan. The blue line represents the calculation for the nominal model of the structure with sharp interfaces. The black line depicts the fit by the model with interfacial roughness. In the fit, the thickness is 5.8 nm and the roughness is 0.6 nm.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 50| Part 3| June 2017| Pages 681-688
https://doi.org/10.1107/S1600576717004137
Follow J. Appl. Cryst.
Sign up for e-alerts
E-alerts
Follow J. Appl. Cryst. on Twitter
Twitter
Follow us on facebook
Facebook
Sign up for RSS feeds
RSS