A multireflection and multiwavelength residual stress determination method using energy dispersive diffraction

Marciszko, M.; Baczmański, A.; Klaus, M.; Genzel, C.; Oponowicz, A.; Wroński, S.; Wróbel, M.; Braham, C.; Sidhom, H.; Wawszczak, R.

doi:10.1107/S1600576718004193

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 7
Examples of $[\langle d{(\phi, \psi)\rangle _{\{ hkl\} }}]$ versus sin²ψ plots for the polished Ti sample obtained using standard analysis and different hkl reflections.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 51| Part 3| June 2018| Pages 732-745

https://doi.org/10.1107/S1600576718004193

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