In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride

Krause, B.; Kuznetsov, D.S.; Yakshin, A.E.; Ibrahimkutty, S.; Baumbach, T.; Bijkerk, F.

doi:10.1107/S1600576718007367

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 2
XPS spectra after non-reactive (red lines) and reactive (black lines) sputter deposition. (a) Survey spectra, (b) an enlargement around La 3d, and (c) an enlargement around N 1s.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 51| Part 4| August 2018| Pages 1013-1020

https://doi.org/10.1107/S1600576718007367

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