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Figure 7
Experimental (open symbols) and simulated (red line) XRR measurements, (a) during and (b) after non-reactive and reactive deposition. The time-dependent measurements were performed at q = 0.2653 Å−1. The roughness development with film thickness (extracted from the fit, red line) is shown on the right-hand side. Reference values determined from fitting complete angular XRR measurements at the indicated thickness are shown as black stars, and the initial growth regime is highlighted (grey background). The angular measurements were performed on thin and thick (∼30 nm) La and LaN films. For the thin films, the deposition was interrupted close to the maximum intensity of the time-dependent measurements [red arrow in panel (a)]. The fit parameters are summarized in Table 1[link].

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 51| Part 4| August 2018| Pages 1013-1020
https://doi.org/10.1107/S1600576718007367
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