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Figure 6
Reference analysis. (a) A SEM image, with the white dot representing one of the many scanned points that contribute to the reference peak within ROI 1. This point, located at the base of the pillar, is also used as a reference for the tilt and strain calculations, since they are directly attached to the substrate. (b) 2D- and (c) 3D-RSMs of the Si 044 reflection recorded at different incident angles. The Si 044 peak is plotted as an isosurface. The measured 1D patterns (dots) are fitted (red curve) with the Gaussian function y = y0 + [A/w(π/2)1/2] exp{−2[(xxc)/w]2}. Further details are provided in the supporting information.

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CRYSTALLOGRAPHY
ISSN: 1600-5767
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