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Figure 6
Experimentally determined layer coverages from in situ XRR and ex situ AFM of 200 Å CuPc thin films grown at 2 Å min−1 and two different substrate temperatures, 310 and 400 K, and comparison with a simulated layer coverage resulting from random deposition without diffusion or any kind of interaction.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 54| Part 1| February 2021| Pages 203-210
https://doi.org/10.1107/S1600576720015472
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