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Figure 5
(a) Simulated response of the intensity of the 524 reflection under different switching mechanisms (1S: one-step mechanism; AP: two-step antipolar mechanism; OT: two-step orthorhombic twin mechanism). The upper x axis limit is [\cos(\phi)/6] as described in the text. The black line is drawn at 20% of the upper axis limit for each reflection The inset shows the result of complete switching for all mechanisms. (b) Simulated response of the 213 reflection [legend and black line formatted in the same manner as (a)].

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 54| Part 2| April 2021| Pages 533-540
https://doi.org/10.1107/S1600576721001096
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