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Figure 2
Schematic pictures of the layered structures containing Ni nanocrystals and NiSi2 nanoplates used for modeling the GISAXS intensity by applying equation (2[link]). (a) A Si wafer covered by a SiO2 thin film and (b) the same sample after removal of the thin film. The relevant crystallographic directions related to the Si(001) wafer and the locations of the layers containing Ni nanocrystals and NiSi2 nanoplates are indicated.

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