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Figure 1
Overview of the stepwise strategy to simulate and fit 2D GISAXS patterns. The upper panels indicate the part of the sample that is simulated in each step of the simulation, and the resulting 2D GISAXS patterns are shown below on a logarithmic intensity scale (see Fig. 2[link]). Dashed lines in the patterns mark the regions where the respective dominant scattering contributions appear for each step. The main parameters adjusted at each step are listed in the lower panels.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 56| Part 5| October 2023| Pages 1330-1347
https://doi.org/10.1107/S1600576723006520
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