Figure 7
Linecuts (a) I at qz = 0.26 nm−1 and (b) II at qy = 0.17 nm−1 of the simulated 2D GISAXS pattern of the representative nanostructured thin film with noise (step 4, open black symbols) and of a simulation including only the substrate with the homogeneous film on top (step 4, red lines). The vertical dashed lines in (b) indicate the critical angles of the film and of the substrate. The inset in (b) shows a close-up of the Yoneda band region from 0.2 to 0.4 nm−1. (c) Residual plot given by (Istep4 − Istep4)/Istep4. Horizontal and vertical dashed lines indicate the positions of linecuts I and II, respectively. |