Design and performance of the high-resolution stress and texture neutron diffractometer HETU

Wang, B.; Zhong, S.; Lin, H.; Li, J.; Yang, Z.; Goukassov, A.; Zhang, H.; Sun, G.-

doi:10.1107/S160057672300763X

Journal of Applied Crystallography Journal of Applied
Crystallography

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Figure 8
The instrument resolution using (a) the silicon monochromator with the (311) or (400) plane and (b) the HOPG monochromator with the (002) or (004) plane under different monochromator-to-sample distances. The dashed or dotted lines are guides for the eye.

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 56| Part 5| October 2023| Pages 1485-1493

https://doi.org/10.1107/S160057672300763X

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