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Figure 3
Evolution of the qXRR surveys during spin coating of the PMMA solution (5 g l−1) at a rotation speed of 30.3 Hz. The PMMA solution was applied to the sample at t = 0 ms. (a) The negative time corresponds to the qXRR from the clean wafer. (b) From 0 to 2.5 s, the beam is scattered due to droplets of PMMA solution on the substrate. (c) After 2.5 s, the first XRR curve with Kiessig oscillations becomes visible as the PMMA layer starts to form and exhibits an increasing level of smoothness represented by the drop of roughness. (d) As the layer continues to thin and become smoother, the Kiessig oscillations in the XRR curve become more pronounced.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 57| Part 2| April 2024| Pages 314-323
https://doi.org/10.1107/S1600576724001171
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