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Figure 7
Differential PDF of Cu-SPR-212 samples annealed at 1000°C. The vertical lines mark the Si—O peak (1.6 Å) eliminated by subtracting the SiOC matrix scattering, the typical M—M (M = Cu, Si) distance (2.6 Å) in Cu-rich metals and the typical M—M distance (3.1 Å) in Cu/Si oxides.

Journal logoJOURNAL OF
APPLIED
CRYSTALLOGRAPHY
ISSN: 1600-5767
Volume 57| Part 4| August 2024| Pages 945-954
https://doi.org/10.1107/S1600576724003133
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