Lattice strain relaxation in thin Mo films grown heteroepitaxially on MgO single crystals

Cejpek, P.; Motylenko, M.; Rafaja, D.

doi:10.1107/S1600576726000233

Figure 1
XRD {110}, {200} and {211} pole figures of the Mo film deposited on the (001)-oriented MgO substrate. Left panels show measured pole figures. Diffracted intensities are displayed in logarithmic scale. Right panels show positions of the individual poles calculated for the orientation relationships $[(001)_{\rm{Mo}}\parallel (001)_{\rm{MgO}}]$ & $[[110]_{\rm{Mo}}\parallel [100]_{\rm{MgO}}]$ (matrix, filled blue circles), $[(\overline{2}12)_{\rm{Mo}}\parallel (001)_{\rm{MgO}}]$ & $[[\bar{1}0\bar{1}]_{\rm{Mo}}\parallel [100]_{\rm{MgO}}]$ (twins, open red boxes) and $[(\bar{1}01)_{\rm{Mo}}\parallel]$ $[(001)_{\rm{MgO}}]$ & $[[\bar{1}0\bar{1}]_{\rm{Mo}}\parallel [100]_{\rm{MgO}}]$ (minor variant, open green triangles). The poles corresponding to the primary orientation variants from equations (2b) and (2c) are highlighted by open symbols with bold edges. The orientation variants resulting from the fourfold rotation of the respective primary variant are plotted using open symbols with thin edges. The grey dashed circles in the right panels mark the maximum sample inclination ( $[|\chi| = 75^{\circ}]$ ) in the measured pole figures (left panels).

JOURNAL OF
APPLIED
CRYSTALLOGRAPHY

ISSN: 1600-5767

Volume 59| Part 1| February 2026| Pages 190-205

https://doi.org/10.1107/S1600576726000233

Open

access

Search IUCr Journals		doi		Advanced search
Author		volume	page